KMITL

Permanent URI for this communityhttps://dspace.kmitl.ac.th/handle/123456789/1

Browse

Search Results

Now showing 1 - 2 of 2
  • Some of the metrics are blocked by your 
    Item type:Publication,
    Fabrications of three dimensional anodic aluminum oxide micro shapes
    (2012-05-01)
    Kasi, Jafar Khan
    ;
    Kasi, Ajab Khan
    ;
    Afzulpurkar, Nitin
    ;
    Hasan, Mahadi
    ;
    Pratontep, Sirapat
    Anodic aluminum oxide (AAO) is one of attractive materials which are used for the fabrication of micro and nanostructures. This paper describes the fabrication of three dimensional (3D) microstructures with AAO nano porous membrane. A simple procedure has been adopted to develop microstructures using the same aluminum (Al) sample without any assistance of scaffold or molding process. Various shapes including micro conical tube, micro cone, and micro bowl structures have been fabricated. Those factors have also been analyzed which are affecting the shapes of microstructures like cracks, angle, and geometry. The fabricated 3D shapes have potential applications in drug delivery system. © 2012 American Scientific Publishers.
  • Some of the metrics are blocked by your 
    Item type:Publication,
    Effect of exposure energy, focus range, and surface reflection on the photolithography process of contact hole patterning
    (2008-10-07)
    Sonboonton, R.
    ;
    Chaowicharat, E.
    ;
    Meesapawong, P.
    ;
    Ladthidej, J.
    ;
    Titiroongruang, W.
    The patterning the contact holes by photolithography process, in this case polysilicon contacts, is the process to produce electrical connection between metal layer and polysilicon gates or metal layer and source/drain. The photolithography process can control size and shape of the contact hole patterns on photoresist before permanently patterned by etching process and then metallization. The contact holes were specified to have the size of 0.8 micron after the photolithography process. In order to achieve this, the process parameters to be considered are exposure energy, focus length of the lens system, and the effect of light reflecting from the film topography underneath. Since in the previous processing step, the attempt to reduce the film topography was done by planarization using BPSG. By adjusting the exposure energy and focus, the optimal condition, to produce 0.8 micron contact holes, was found to be energy of 305 mJ/cm and focus of-1.0 μm. © 2008 IEEE.