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Omnidirectional anti-reflection properties of vertically align SiO2 nanorod films prepared by electron beam evaporation with glancing angle deposition
(2018-01-01)
Prachachet, R.
;
Samransuksamer, B.
;
Horprathum, M.
;
Eiamchai, P.
;
Limwichean, S.
Omnidirectional anti-reflection coating nanostructure film have attracted enormous attention for the developments of the optical coating, lenses, light emitting diode, display and photovoltaic. However, fabricated of the omnidirectional antireflection nanostructure film on glass substrate in large area was a challenge topic. In the past two decades, the invention of glancing angle deposition technique as a growth of well-controlled two and three-dimensional morphologies has gained significant attention because of it is simple, fast, cost-effective and high mass production capability. In this present work, the omnidirectional anti-reflection nanostructure coating namely silicon dioxide (SiO<inf>2</inf>) nanorods has been investigated for optimized high transparent layer at all light incident angle. The SiO<inf>2</inf> nanorod films of an optimally low refractive index have been fabricated by electron beam evaporation with the glancing angle deposition technique. The morphological of the prepared sampled were characterized by field-emission scanning electron microscope (FE-SEM) and high-resolution transmission electron microscope (HRTEM). The optical transmission and omnidirectional property of the SiO<inf>2</inf> nanorod films were investigated by UV-Vis-NIR spectrophotometer. The measurement were performed at normal incident angle and a full spectral range of 200 - 2000 nm. The angle dependent transmission measure were investigated by rotating the specimen, with incidence angle defined relative to the surface normal of the prepared samples. The morphological characterization results showed that when the glancing angle deposition technique was applied, the vertically align SiO<inf>2</inf> nanorods with partially isolated columnar structure can be constructed due to the enhanced shadowing and limited addtom diffusion effect. The average transmission of the vertically align SiO<inf>2</inf> nanorods were higher than the glass substrate reference sample over the visible wavelength range at all incident angle due to the transition in the refractive index profile from air to the nanostructure layer that improved the anti-reflection characteristics.
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A comparative study on omnidirectional anti-reflection SiO2 nanostructure films coating by glancing angle deposition
(2018-01-01)
Prachachet, R.
;
Samransuksamer, B.
;
Horprathum, M.
;
Eiamchai, P.
;
Limwichean, S.
Fabricated omnidirectional anti-reflection nanostructure films as a one of the promising alternative solar cell applications have attracted enormous scientific and industrial research benefits to their broadband, effective over a wide range of incident angles, lithography-free and high-throughput process. Recently, the nanostructure SiO<inf>2</inf> film was the most inclusive study on anti-reflection with omnidirectional and broadband characteristics. In this work, the three-dimensional silicon dioxide (SiO<inf>2</inf>) nanostructured thin film with different morphologies including vertical align, slant, spiral and thin films were fabricated by electron beam evaporation with glancing angle deposition (GLAD) on the glass slide and silicon wafer substrate. The morphological of the prepared samples were characterized by field-emission scanning electron microscope (FE-SEM) and high-resolution transmission electron microscope (HRTEM). The transmission, omnidirectional and birefringence property of the nanostructure SiO<inf>2</inf> films were investigated by UV-Vis-NIR spectrophotometer and variable angle spectroscopic ellipsometer (VASE). The spectrophotometer measurement was performed at normal incident angle and a full spectral range of 200 - 2000 nm. The angle dependent transmission measurements were investigated by rotating the specimen, with incidence angle defined relative to the surface normal of the prepared samples. This study demonstrates that the obtained SiO2 nanostructure film coated on glass slide substrate exhibits a higher transmission was 93% at normal incident angle. In addition, transmission measurement in visible wavelength and wide incident angles -80 to 80 were increased in comparison with the SiO2 thin film and glass slide substrate due to the transition in the refractive index profile from air to the nanostructure layer that improve the antireflection characteristics. The results clearly showed the enhanced omnidirectional and broadband characteristic of the three dimensional SiO2 nanostructure film coating.
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Ag nanoparticle-doped SiO2/TiO2 hybrid optical sensitive thin film for optical element applications
(2016-11-25)
Junlabhut, P.
;
Boonruang, S.
;
Mekprasart, W.
;
Pecharapa, W.
The optical sensitive thin film by Ag nanoparticles doped SiO<inf>2</inf>/TiO<inf>2</inf> hybrid was successfully deposited via sol-gel spin coating technique. Photo-induced polymerization of photosensitive Ag-doped SiO<inf>2</inf>/TiO<inf>2</inf> hybrid initiated by irgacure 784 photoinitiator was illustrated under visible region by He[sbnd]Cd laser 442 nm. Silane coupling was used as a starting precursor to providing cross-linking in the photochemical reaction process. The structural properties and existing elements of photosensitive films were characterized by XRD, TEM and EDX. Meanwhile, surface morphology of the photosensitive hybrid films was monitored by FE-SEM. Moreover, the optical absorption of the photosensitive hybrid films was analyzed by UV–Vis spectroscopy. These results indicated that the compatibility of photosensitive hybrid material was formed. The SiO<inf>2</inf>/TiO<inf>2</inf> photosensitive hybrid films with uniformly distributed Ag ions and intensive coloration characteristic for surface plasmon resonance phenomena relating to the enhancement of optical absorption in visible region. As-prepared photosensitive hybrid films with enhanced optical properties can be proposed for optical elements.
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Ag-doped SiO2/TiO2 hybrid optical sensitive thin films with visible absorption enhancement for diffractive optical element application
(2013-03-13)
Junlabhut, P.
;
Boonruang, S.
;
Pecharapa, W.
This paper reports the synthesis of Ag-doped SiO<inf>2</inf>/TiO <inf>2</inf> hybrid optical sensitive thin films deposited by sol-gel spin coating technique. The structural properties of thin films were characterized by XRD, TEM and EDX. The optical absorption of the films in visible region measured by UV-VIS can be enhanced by Ag nanoparticles due to surface plasmon resonance effect. Photosensitive film can be utilized as effective photosensitive material for diffractive optical element with controllable period by interference angle using interference lithography technique. AFM was employed to investigate the fabricated patterns. The diffraction pattern highly correlated to the performance of diffractive optical element is scrutinized. © 2013 IEEE.
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N-doped MgZnO alloy thin film prepared by sol-gel method
(2011-06-30)
Chongsri, K.
;
Boonruang, S.
;
Techitdheera, W.
;
Pecharapa, W.
In this work, nitrogen-doped MgZnO thin films were deposited on glass substrate by spin-coating technique and thermal annealing treatment. The X-ray diffraction (XRD), scanning electron microscope (SEM) and optical transmission measurement were carried out to investigate the effect of growth temperature and nitrogen doping on the physical and optical properties of the films. XRD and SEM results revealed that the crystallinity and preferred c-axis orientation was enhanced with increasing annealing temperature and certain concentration of N-doping. In addition, the films incorporated with nitrogen doping exhibit significant blue shift in optical band gap and improvement in its transparency. © 2011 Elsevier B.V. All rights reserved.

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