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Author: search.filters.author.Eiamchai, PitakSubject: search.filters.subject.Sputtering

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    Tailoring the structural and optical properties of fabricated TiO2 thin films by O2 duty cycle in reactive gas-timing magnetron sputtering
    (2023-08-01)
    Chittinan, Donyawan
    ;
    Buranasiri, Prathan
    ;
    Lertvanithphol, Tossaporn
    ;
    Eiamchai, Pitak
    ;
    Tantiwanichapan, Khwanchai
    Titanium dioxide (TiO<inf>2</inf>) thin films were deposited on silicon (100) and glass substrates via conventional reactive sputtering and reactive gas-timing (RGT) sputtering techniques. The duty cycle of supplied O<inf>2</inf> gas determined its effect on the properties of the TiO<inf>2</inf> films through spectroscopic ellipsometry (SE). With the best triple-layer model for SE fitting, the films' structure and optical properties were analyzed and compared. The high-resolution transmission electron microscope (HR-TEM) showed good agreement with the structure of the SE model, while the grazing-incidence X-ray diffraction (GIXRD) confirmed the crystallinity of the films. The results showed that the duty cycle was a crucial factor in the deposition rate and crystalline phase of the TiO<inf>2</inf> films. The optical reflectance (%R) spectra were measured by a UV-VIS-NIR spectrophotometer, representing anti-reflection properties at a specific wavelength related to the duty cycle. Moreover, the omnidirectional optical transmittance (Omni-T) profiles were also determined. The results showed that the transmittances (%T) of TiO<inf>2</inf> film near those specific wavelengths were enhanced over the bare glass substrate at a wide angle. In addition, photoelectron spectroscopy (PES) was used to confirm the chemical states and atomic compositions.
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    Determination of thickness and optical properties of tantalum oxide thin films by spectroscopic ellipsometry
    (2014-01-01)
    Chananonnawathorn, Chanunthorn
    ;
    Khemasiri, Narathon
    ;
    Srichaiyaperk, Thanat
    ;
    Samransuksamer, Benjarong
    ;
    Horprathum, Mati
    Tantalum oxide (Ta<inf>2</inf>O<inf>5</inf>) thin films were prepared, at different deposition time, by a DC reactive magnetron sputtering. During the deposition, a high-quality tantalum target was sputtered under argon and oxygen ambience on to silicon (100) and glass substrates. The prepared thin films were systematically characterized for both physical and optical properties based on spectroscopic ellipsometry (SE), and consequently confirmed by several methods. With the SE physical models, we could determine the thin film thickness as well as their inhomogeneity. The films thickness results were directly confirmed by field-emission scanning electron microscopy (FE-SEM) used to observe cross-sections, and surface profiler used to measure the physical thickness of the films. With the SE optical models, we applied both the Cauchy and Tauc-Lorentz dispersions in order to obtain the optical constants, to be directly compared with those from the Swanepoel method (SM). Our result showed that from the SE analyses, the SE physical model was obtained as the multi-layer configurations. The obtained Ta<inf>2</inf>O<inf>5</inf> thin film thickness was closely related with the measured result from the FE-SEM cross-sectional micrographs and the surface profiler. For the optical characteristic, the double layer physical model was best optimized with the Tauc Lorentz dispersion model for the most accurate results. In comparison, the SM technique also demonstrated a capability to determine both the film thickness and its refractive index only from some samples. Therefore, this study proved that the SE technique successfully and accurately determine both the physical and optical properties of the Ta<inf>2</inf>O<inf>5</inf> thin films. © (2014) Trans Tech Publications, Switzerland.