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Author: search.filters.author.Lertvanithphol, TossapornSubject: search.filters.subject.Sputtering

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    Tailoring the structural and optical properties of fabricated TiO2 thin films by O2 duty cycle in reactive gas-timing magnetron sputtering
    (2023-08-01)
    Chittinan, Donyawan
    ;
    Buranasiri, Prathan
    ;
    Lertvanithphol, Tossaporn
    ;
    Eiamchai, Pitak
    ;
    Tantiwanichapan, Khwanchai
    Titanium dioxide (TiO<inf>2</inf>) thin films were deposited on silicon (100) and glass substrates via conventional reactive sputtering and reactive gas-timing (RGT) sputtering techniques. The duty cycle of supplied O<inf>2</inf> gas determined its effect on the properties of the TiO<inf>2</inf> films through spectroscopic ellipsometry (SE). With the best triple-layer model for SE fitting, the films' structure and optical properties were analyzed and compared. The high-resolution transmission electron microscope (HR-TEM) showed good agreement with the structure of the SE model, while the grazing-incidence X-ray diffraction (GIXRD) confirmed the crystallinity of the films. The results showed that the duty cycle was a crucial factor in the deposition rate and crystalline phase of the TiO<inf>2</inf> films. The optical reflectance (%R) spectra were measured by a UV-VIS-NIR spectrophotometer, representing anti-reflection properties at a specific wavelength related to the duty cycle. Moreover, the omnidirectional optical transmittance (Omni-T) profiles were also determined. The results showed that the transmittances (%T) of TiO<inf>2</inf> film near those specific wavelengths were enhanced over the bare glass substrate at a wide angle. In addition, photoelectron spectroscopy (PES) was used to confirm the chemical states and atomic compositions.
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    Tailoring Properties of Hafnium Nitride Thin Film via Reactive Gas-Timing RF Magnetron Sputtering for Surface Enhanced-Raman Scattering Substrates
    (2022-01-01)
    Sucheewa, Nguentra
    ;
    Wongwiriyapan, Winadda
    ;
    Klamchuen, Annop
    ;
    Obata, Michiko
    ;
    Fujishige, Masatsugu
    This study successfully demonstrated the tailoring properties of hafnium nitride (HfN) thin films via reactive gas-timing (RGT) RF magnetron sputtering for surface-enhanced Raman spectroscopy (SERS) substrate applications. The optimal RGT sputtering condition was investigated by varying the duration time of the argon and nitrogen gas sequence. The RGT technique formed thin films with a grain size of approximately 15 nm. Additionally, the atomic ratios of nitrogen and hafnium can be controlled between 0.24 and 0.28, which is greater than the conventional technique, resulting in a high absorbance in the long wavelength region. Moreover, the HfN thin film exhibited a high Raman signal intensity with an EF of 8.5 × 104 to methylene blue molecules and was capable of being reused five times. A superior performance of HfN as a SERS substrate can be attributed to its tailored grain size and chemical composition, which results in an increase in the hot spot effect. These results demonstrate that the RGT technique is a viable method for fabricating HfN thin films with controlled properties at room temperature, which makes them an attractive material for SERS and other plasmonic applications.