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Author: search.filters.author.Noonuruk, RussameerukSubject: search.filters.subject.Electrochromic

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    Effects of Zn-dopant on structural properties and electrochromic performance of sol-gel derived NiO thin films
    (2015-06-01)
    Noonuruk, Russameeruk
    ;
    Mekprasart, Wanichaya
    ;
    Pecharapa, Wisanu
    Zn-doped NiO thin films were prepared by sol-gel spin-coating method onto transparent conducting substrates using nickel acetate tetrahydrate and zinc acetate dehydrate as starting precursors. Effects of zinc doping content on the structural, optical and electrochromic properties of NiO films were investigated by X-ray diffraction, X-ray photoelectron spectroscopy, field emission-scanning electron microscope, atomic force microscopy, UV-VIS spectrophotometer and cyclic voltammetry. The results reveal that Zn doping has significant influence on crystallinity deterioration, surface topography alternation and electrochromic performance of the films. The expansion of active surface area due to reduced crystallinity of the films resulting to the increase of charge transfer in the electrochemical reaction. It is indicated that electrochromic performance of sol-gel derived NiO films can be ameliorated by the incorporation of Zn additive at specific content.
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    Effect of sputtering power on physical properties and electrochromic performance of sputtered-WO3 thin films
    (2013-10-29)
    Noonuruk, Russameeruk
    ;
    Paipitak, Khanokkorn
    ;
    Horprathum, Mati
    ;
    Techitdheera, Wichan
    ;
    Porntheeraphat, Supanit
    Tungsten oxide (WO<inf>3</inf>) electrochromic thin films were deposited onto F-doped tin oxide (FTO) substrates using DC sputtering of tungsten target in presence of oxygen and argon gas. Asdeposited films were prepared with different sputtering power at 50 W, 100W and 200W. The effect of power on structural, surface morphology optical and electrochromic properties of the WO<inf>3</inf> thin films were characterized by X-ray diffractometer, scanning electron microscope, UV-VIS spectrophotometer and Cyclic voltammetry, respectively. The XRD results show that the crystalline of WO<inf>3</inf> can be identified an orientation growth along (222) plane. The average grain size evaluated from SEM image is approximately 200 nm. The films deposited at power of 200 W exhibited better electrochromic properties with greatest optical modulation (ΔT) value of ΔT = 31.2% at λ= 550 nm. The cyclic voltammograms (CV) of WO<inf>3</inf> thin films evidently exhibited that the WO<inf>3</inf> films prepared at power of 200 W displayed the superior electrochromic performance, compared to the others. © (2013) Trans Tech Publications, Switzerland.