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Author: search.filters.author.Paosawatyanyong, BoonchoatSubject: search.filters.subject.Fe3Si film

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    Determining the Annealing Temperature Dependency of Wetting and Mechanical Features on Fe3Si Films
    (2023-08-01)
    Borwornpornmetee, Nattakorn
    ;
    Achirawongwat, Chawapon
    ;
    Traiprom, Thawichai
    ;
    Saekow, Bunpot
    ;
    Porntheeraphat, Supanit
    The impact of thermal annealing under temperature alteration on the wetting and mechanical attributes of Fe<inf>3</inf>Si films built through facing target sputtering (FTS) is an essential topic for study in order to identify their characteristics under varying temperatures. Consequently, we introduced a thermal annealing process in a vacuum for two hours under varying temperatures of 300, 600, and 900 °C to our Fe<inf>3</inf>Si films created via FTS. The primary purpose of this current research is to examine the effect of the thermal annealing technique under temperature alteration on the wetting and mechanical traits of Fe<inf>3</inf>Si films. In this research, Fe<inf>3</inf>Si films were built onto the Si wafer by FTS and divided for use in thermal annealing under temperature alteration. The structural, morphological, wetting, and mechanical traits of the Fe<inf>3</inf>Si films under thermal annealing are provided in the present work. Based on our information, this work represents an original study on the change in wetting and mechanical traits of Fe<inf>3</inf>Si films through thermal annealing under temperature alteration.
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    Physical properties of fe3si films coated through facing targets sputtering after microwave plasma treatment
    (2021-08-01)
    Borwornpornmetee, Nattakorn
    ;
    Charoenyuenyao, Peerasil
    ;
    Chaleawpong, Rawiwan
    ;
    Paosawatyanyong, Boonchoat
    ;
    Phatthanakun, Rungrueang
    Fe<inf>3</inf>Si films are deposited onto the Si(111) wafer using sputtering with parallel facing targets. Surface modification of the deposited Fe<inf>3</inf>Si film is conducted by using a microwave plasma treatment under an Ar atmosphere at different powers of 50, 100 and, 150 W. After the Ar plasma treatment, the crystallinity of the coated Fe<inf>3</inf>Si films is enhanced, in which the orientation peaks, including (220), (222), (400), and (422) of the Fe<inf>3</inf>Si are sharpened. The extinction rule suggests that the B<inf>2</inf>–Fe<inf>3</inf>Si crystallites are the film’s dominant composition. The stoichiometry of the Fe<inf>3</inf>Si surfaces is marginally changed after the treatment. An increase in microwave power damages the surface of the Fe<inf>3</inf>Si films, resulting in the generation of small pinholes. The roughness of the Fe<inf>3</inf>Si films after being treated at 150 W is insignificantly increased compared to the untreated films. The untreated Fe<inf>3</inf>Si films have a hydrophobic surface with an average contact angle of 101.70<sup>◦</sup> . After treatment at 150 W, it turns into a hydrophilic surface with an average contact angle of 67.05<sup>◦</sup> because of the reduction in the hydrophobic carbon group and the increase in the hydrophilic oxide group. The hardness of the untreated Fe<inf>3</inf>Si is ~9.39 GPa, which is kept at a similar level throughout each treatment power.