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Author: search.filters.author.Porntheeraphat, SupanitSubject: search.filters.subject.Tantalum oxide

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    High performance metal surface coating using Ta2O5 thin film prepared by D. C. magnetron sputtering
    (2014-01-01)
    Khemasiri, Narathon
    ;
    Chananonnawathorn, Chanunthorn
    ;
    Horprathum, Mati
    ;
    Eiamchai, Pitak
    ;
    Chindaudom, Pongpan
    Tantalum oxide (Ta<inf>2</inf>O<inf>5</inf>) thin films were deposited as the protective layers for the metal surface finishing by the DC reactive magnetron sputtering system. The effect of the Ta<inf>2</inf>O<inf>5</inf> film thickness, ranging from 25 nm to 200 nm, on the physical properties and the anti-corrosive performance were investigated. The grazing-incidence X-ray diffraction (GIXRD) and the atomic force microscopy (AFM) were used to examine the crystal structures and the surface topologies of the prepared films, respectively. The XRD results showed that the Ta<inf>2</inf>O<inf>5</inf> thin films were all amorphous. The AFM micrographs demonstrated the film morphology with quite smooth surface features. The surface roughness tended to be rough when the film thickness was increased. To examine the protective performance of the films, the poteniostat and galvanometer was utilized to examine the electrochemical activities with the 1M NaCl as the corrosive electrolyte. The results from the I-V polarization curves (Tafel slope) indicated that, with the Ta<inf>2</inf>O<inf>5</inf> thin film, the current density was significantly reduced by 3 orders of magnitude when compared with the blank sample. Such results were observed because of fully encapsulated surface of the samples were covered with the sputtered Ta<inf>2</inf>O<inf>5</inf> thin films. The study also showed that the Ta<inf>2</inf>O<inf>5</inf> thin film deposited at 50 nm yielded the most extreme protective performance. The Ta<inf>2</inf>O<inf>5</inf> thin films therefore could be optimized for the smallest film thickness for highly potential role in the protective performance of the metal surface finishing products. © (2014) Trans Tech Publications, Switzerland.
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    Effect of operated pressure on anticorrosive behavior of Ta2O5 thin film grown by D.C. reactive magnetron sputtering system
    (2013-10-29)
    Khemasiri, Narathon
    ;
    Chananonnawathorn, Chanunthorn
    ;
    Horprathum, Mati
    ;
    Rayanasukha, Yossawat
    ;
    Phromyothin, Darinee
    Tantalum oxide (Ta<inf>2</inf>O<inf>5</inf>) thin films, 100 nm thick were deposited by D.C. reactive magnetron sputtering system at different operated pressure on unheated p-type silicon (100) wafer and 304 stainless substrates. Their crystalline structure, film surface morphology and optical properties, as well as anticorrosive behavior, were investigated. The structure and morphology of films were characterized by grazing-incidence X-ray diffraction (GIXRD) and atomic force microscopy (AFM). The optical properties were determined by spectroscopic ellipsometry (SE). The corrosion performances of the films were investigated through potentiostat and immersion tests in 1 M NaCl solutions. The results showed that as-deposited Ta<inf>2</inf>O<inf>5</inf> thin films were amorphous. The refractive index varied from 2.06 to 2.17 (at 550 nm) with increasing operated pressure. The corrosion rate of Ta<inf>2</inf>O<inf>5</inf> thin film improves as the operated pressure decreases. The Ta<inf>2</inf>O<inf>5</inf> thin films deposited at 3 mTorr operated pressure could be exhibited high performance anticorrosive behavior. © (2013) Trans Tech Publications, Switzerland.