Sakdanuphab, Rachsak
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Sakdanuphab, Rachsak
Alternative Name
Sakdanuphab, R.
Sakdanuphab, Rachasak
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rachsak.sa@kmitl.ac.th
6 results
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Item type:Publication, Effect of annealing temperature on thermoelectric properties of bismuth telluride thick film deposited by DC magnetron sputtering(2020-07-15) ;Kianwimol, Supasak; ;Chanlek, Narong ;Harnwunggmoung, AdulWe report the thermoelectric properties of thick bismuth-telluride (Bi<inf>2</inf>Te<inf>3</inf>) films deposited on polyimide substrates by DC magnetron sputtering and annealed at various temperatures (150–350 °C). The influence of annealing temperature on the microstructure and electronic structure of thick Bi<inf>2</inf>Te<inf>3</inf> films is discussed. In this work, the annealed film at 250 °C has the best thermoelectric property due to highest electrical conductivity and Seebeck coefficient. The main effect of annealing temperature was really helpful to improve crystalline structure and enhance carrier mobility, whereas the carrier concentration was reduced due to the volatile of tellurium atom during annealing. Chemical states of bound and unbound atoms (Bi, Bi<sup>3+</sup>, Te, and Te<sup>2‐</sup>) on the surface play an important role in electrical properties. The exceed temperature caused the micro-crack formation and affect carrier transport by the scattering. The power factor of Bi<inf>2</inf>Te<inf>3</inf> deposited by DC magnetron sputtering and annealed at 250 °C is comparable to the power factors of thick Bi<inf>2</inf>Te<inf>3</inf> film deposited by various deposition techniques. The output power of single-leg, thick, thermoelectric Bi<inf>2</inf>Te<inf>3</inf> film annealed at 250 °C as a function temperature generated a power of 0.98 μW at a temperature difference of 50 °C. - Some of the metrics are blocked by yourconsent settings
Item type:Publication, Simultaneous O2 plasma and thermal treatment for improved surface conductivity of Cu-Doped SnO2 films(2019-08-01); ; ;Chanlek, Narong ;Chirawatkul, PraeCu-doped SnO<inf>2</inf> thin films were deposited on a glass substrate using radio frequency magnetron sputtering. The effects of varying the O<inf>2</inf> partial pressure during the deposition process and post-O<inf>2</inf> plasma treatment at 420 °C were investigated. Bulk and surface oxidation states were measured by X-ray absorption near-edge structure spectroscopy and X-ray photoelectron spectroscopy. The as-deposited films exhibited oxygen deficient compositions and Cu<sup>+</sup> or Cu<sup>2+</sup> ions, which depend on the deposited O<inf>2</inf> partial pressure. After the post-plasma treatment, the films changed from an amorphous structure into a low crystalline film. X-ray diffraction results indicated substitutional doping, wherein some Sn<sup>4+</sup> ions were replaced with Cu<sup>+</sup> or Cu<sup>2+</sup> ions. The O<inf>2</inf> plasma treatment can remove Cu<sup>2+</sup> and O<sup>2−</sup> from the film surface. The oxygen deficiency defects and Cu<sup>+</sup>- or Cu<sup>2+</sup>- doped present at the surface are the key factors in controlling the sheet resistance of the Cu-doped SnO<inf>2</inf> film. The minimum sheet resistance was obtained after the plasma treatment of the films deposited at a 2% O<inf>2</inf> partial pressure. - Some of the metrics are blocked by yourconsent settings
Item type:Publication, Figure of merit improvement of delafossite CuAlO2 with the addition of Fe and graphene(2019-11-01) ;Daichakomphu, Noppanut ;Harnwunggmoung, Adul ;Chanlek, Narong; This study investigated the synthesis of delafossite CuAlO<inf>2</inf> with Fe and graphene through a solid-state reaction method. The results of X-ray diffractometry showed that graphene was insoluble in delafossite CuAlO<inf>2</inf> while Fe was substituted into Al sites, expanding the d-spacing. From X-ray photoelectron spectroscopy, graphene induced excess oxygen in the delafossite CuAlO<inf>2</inf> structure via C–O–Cu bonds and improved the electrical conductivity. In addition, the thermal conductivity was reduced due to generation of point defects, phonon-phonon Umklapp and carrier-phonon scattering. The addition of Fe and graphene in CuAlO<inf>2</inf> shows an improvement of ZT to 0.0114 at 573 K. This is attributable to its increase in charge carrier density, as well as a decrease in thermal conductivity. This study highlights the benefits of combining Fe and graphene in delafossite CuAlO<inf>2</inf> as a prospective process for attaining a high figure of merit thermoelectric materials. - Some of the metrics are blocked by yourconsent settings
Item type:Publication, Optimization of the nitrogen content for room temperature rapid synthesis of CuI thin films via liquid iodination method using Cu3N film as precursor(2020-06-01) ;Khumtong, Tanakorn ;Chanlek, Narong; ; In this work, we demonstrate that CuI films can be obtained by the liquid–phase iodination method with the chemical reaction time only being 1 min between Cu<inf>3</inf>N and aqueous iodine solution at room temperature. This is a simple and eco-friendly method with high transparency and low resistivity. The Cu<inf>3</inf>N precursors were prepared by reactive DC magnetron sputtering using different N<inf>2</inf> partial pressures. The effect of nitrogen content of precursor (Cu<inf>3</inf>N) on the structural, electrical, and optical properties of CuI thin films was discussed. Electronegativity property was used to explain the growth mechanism of CuI films prepared by different nitrogen content in the precursor. By growing the CuI films with a N<inf>2</inf>:Ar gas ratio of 5:2, the average transmittance achieved was 75% in the visible spectral range, and the lowest resistivity achieved was 3.67 × 10<sup>–2</sup> Ω cm. These results suggest that the liquid iodination method using Cu<inf>3</inf>N film as precursor (N<inf>2</inf>:Ar gas ratio of 5:2) was suitable for preparing high-quality CuI films for application in transparent electronics. - Some of the metrics are blocked by yourconsent settings
Item type:Publication, Enhanced carrier concentration of Fe doped delafossite CuAlO2 by double-effect: Divalent metal ions doping and excess oxygen(2018-12-15) ;Daichakomphu, Noppanut; ;Harnwunggmoung, Adul ;Puarporn, YingyotChanlek, NarongBulk CuAlO<inf>2</inf> compound has been widely studied as a p-type metal oxide semiconductor material due to the simplicity in its synthesis and use of inexpensive raw materials. The Fe doping in CuAlO<inf>2</inf> has been demonstrated to enhance the electrical conductivity. An in-depth analysis of the effect of Fe doping in CuAlO<inf>2</inf> on the carrier concentration improvement was revealed. Delafossite CuAl<inf>1−x</inf>Fe<inf>x</inf>O<inf>2</inf> powders with x = 0.00, 0.05, 0.10, 0.15, 0.20 and 0.30 were synthesized by a solid-state reaction method. The X-ray photoelectron spectroscopy (XPS) and X-ray absorption spectroscopy (XAS) studies were used to measure the atomic-ion concentrations and the oxidation state of each element. The variations of carrier concentration corresponded with a ratio of Cu<sup>2+</sup>/Cu<sup>1+</sup> in CuAlO<inf>2</inf>. We found that the increase of Cu<sup>2+</sup>/Cu<sup>1+</sup> was caused by double effects through divalent metal ions (Fe<sup>2+</sup>) doping and excess oxygen (O<inf>2−δ</inf>) in CuAlO<inf>2</inf>. The maximum carrier concentration of 8.09 × 10<sup>17</sup> cm<sup>−3</sup> was obtained for the CuAlO<inf>2</inf> sample at Fe content of 10 at.%. - Some of the metrics are blocked by yourconsent settings
Item type:Publication, Room-temperature rapid synthesis of CuI thin films via liquid iodination method(2020-05-01) ;Posopa, Narongsak; ;Chanlek, Narong ;Kaewkhao, JakrapongIn this work, we successfully synthesised highly transparent and conducting CuI thin films at room temperature via a rapid chemical reaction between the Cu<inf>3</inf>N precursor and aqueous iodine solution. The effect of the precursor (Cu or Cu<inf>3</inf>N) on the structural, electrical, and optical properties of the CuI thin films was investigated. The X-ray diffraction results revealed that the prepared films were polycrystalline, preferentially oriented along the (111) planes of the zinc blende structure. In addition, we found that the nitrogen content of the precursor significantly affected the optical and electrical properties of the CuI films. The CuI film obtained by dipping Cu<inf>3</inf>N film into aqueous iodine solution for 1 min exhibited a conductivity of 29.36 Scm<sup>−1</sup> and transmittance of 75% in the visible region. We expect that these findings would assist researchers to rapidly synthesise CuI thin films for transparent electronic devices.
