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  4. Effects of Ag-doped Content on Antimicrobial Activity and Substrate Color of Chromium Thin Films Deposited by DC Magnetron Sputtering
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Effects of Ag-doped Content on Antimicrobial Activity and Substrate Color of Chromium Thin Films Deposited by DC Magnetron Sputtering

Author(s)
Thanasriswad, Pawarun
Sakdanuphab, Rachsak
Sakulkalavek, Aparporn
Worananthakij, Worakrit
Date Issued
October 26, 2024
Type
Article
DOI
10.55003/cast.2023.255965
Abstract
Silver ions (Ag+) show promise as excellent antimicrobial agents to inhibit microbial growth on high-touch surfaces. In this study, Ag-doped Cr films were deposited using a DC magnetron sputtering system from a mosaic target. The Cr-Ag mosaic target was a 0.125-inch-thick Cr base (99.95% pure) with different diameters of Ag circle sheets mounted on the Cr target. The sputtering condition was kept at a DC power of 100W, working pressure of 8.3x10-3 mbar with Ar as the sputtering gas, and sputtering times of 15 and 30 min. The antimicrobial activity and efficiency were determined by standard testing (JIS Z 2801: 2000). The antibacterial performance was calculated from the antibacterial inhibition of the Ag-doped Cr films in bacterial solution (Staphylococcus aureus and Escherichia coli) after 24 h. The results showed that the Ag content was between 0.27 at% and 6.11 at% depending on the diameter of Ag and the deposition time. The minimum Ag content of 4.05 at% had an inhibition efficiency of 99.98% (E. coli) and 96.33% (S. aureus). The contact angle testing of Ag-doped Cr films showed hydrophobic behavior with the angle greater than 90 degrees. The optical color of the Ag-doped films was characterized by UV-vis spectroscopy (CIE testing). The film colors were significantly changed by the addition of Ag into the Cr films. The total color difference (∆E) increased by 3-10 units compared to the reference chromium film and the Ag doping mainly affected +L* (Lightness).
Citation
Current Applied Science and Technology, 24(1), 2024
Subjects

antibacterial agent

CIE-L*ab

gram-negative

gram-positive

mosaic target

ROS

silver

sputtering PVD

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