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Corrigendum to “Wetting state and mechanical property alteration for the Fe3Si films using rapid thermal annealing under various temperatures” [Heliyon Volume 9, Issue 12, December 2023, Article e22511](S2405844023097190)(10.1016/j.heliyon.2023.e22511)
Author(s)
Borwornpornmetee, Nattakorn
Traiprom, Thawichai
Kusaba, Takafumi
Sittimart, Phongsaphak
Naragino, Hiroshi
Paosawatyanyong, Boonchoat
Yoshitake, Tsuyoshi
Date Issued
May 1, 2025
Type
Erratum
Abstract
In the original published version of this article, reference [22] was added in error: P. Du et al. tuned the mechanical properties of SiOC films with RTA under nitrogen ambient at different temperatures of 400, 600, and 800 °C for 10 min [21]. The treated SiOC films showed a change in residual stress, turning from compressive to tensile after RTA, and an improvement in hardness and Young's modulus as the temperatures were raised [22]. [22] Z. Bazhan, F.E. Ghodsi, J. Mazloom, Effect of phase transition induced by annealing temperature on wettability, optical and photocatalytic properties of nanostructured iron oxide thin film, J. Mater. Sci. Mater. Electron. 29 (2018) 11489–11497, https://doi.org/10.1007/s10854-018-9244-4. The reference and citation have been removed and the references have been renumbered accordingly. The intext citations have been updated to reflect this change. The correct version can be found below: P. Du et al. tuned the mechanical properties of SiOC films with RTA under nitrogen ambient at different temperatures of 400, 600, and 800 °C for 10 min [21]. The treated SiOC films showed a change in residual stress, turning from compressive to tensile after RTA, and an improvement in hardness and Young's modulus as the temperatures were raised. The authors apologize for the errors. Both the HTML and PDF versions of the article have been updated to correct the errors.
Citation
Heliyon, 11(10), 2025