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RF-sputtered V2O5 thin films on two different glass substrates
Author(s)
Thowladda, Warawoot
Date Issued
January 1, 2021
Type
Conference Paper
Abstract
Thin V2O5 films were deposited on two different commercial soda-lime glass substrates (A and B) by O2 reactive radio frequency magnetron sputtering using a vanadium target. The influences of the surface energy and roughness of the substrates on the structure and atomic bonding of the films were examined. The film on substrate A was polycrystalline, with eight crystal orientations, whereas the film on substrate B yielded an intense (001) diffraction peak of α-V2O5 and a weak (200) peak of β-V2O5, indicating preferred orientation along these planes. Structural analyses indicated that substrate B with lower surface energy and higher roughness enhanced the formation of a layered a-V2O5 structure.
Citation
Materials Today Proceedings, 49, 1263-1267, 2021