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  4. Hole doping through indium intercalation into nickel phthalocyanine
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Hole doping through indium intercalation into nickel phthalocyanine

Author(s)
Prajuabwan, Pakorn
Rojanasuwan, Sunit
Chanhom, Annop
Jaruvanawat, Anuchit
Rangkasikorn, Adirek
Nukeaw, Jiti
Date Issued
April 29, 2013
Type
Conference Paper
DOI
10.4028/www.scientific.net/AMM.313-314.148
Abstract
A new intercalation of indium and nickel phthalocyanine(NiPc) thin films is developed by using thermal co-evaporation technique. X-ray diffractometer(XRD) and optical absorption spectroscopy of In-doped NiPc suggest the crystal structure of In-doped NiPc is α-phase as same as that of pristine NiPc. Current-voltage characteristic of Shottky diode fabricated with In-doped NiPc thin film shows the enhancement of charge carrier concentration due to indium doping. Further photoelectron spectroscopy experiments prove that In-doped NiPc is hole transport material. © (2013) Trans Tech Publications, Switzerland.
Citation
Applied Mechanics and Materials, 313-314, 148-156, 2013
Subjects

Electron doping

Hole doping

Indium doped nickel p...

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