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White noise in silicon-based planar metal-semiconductor-metal photodiodes
Author(s)
Khunkhao, S.
Nanthivatana, P.
Niemcharoen, S.
Titiroongruang, W.
Sato, K.
Ruangphanit, A.
Phongphanchanthra, N.
Date Issued
October 6, 2008
Type
Conference Paper
Abstract
Low-frequency 3-100 kHz shot noise (white noise) emerging from photoinduced current in Mo/n-Si/Mo structures leaving undepleted region has been observed under different bias and optical intensity conditions. The measurements revealed that the current noise observed depends not only on the illumination intensity levels but also on bias voltage. The current noise observed is expressed as S(ω)=2IΓ2 and analyzed, where I and Γ2 is the average current and noise factor, respectively. The measurements reveal that Γ2 has strong bias dependence, lying Γ2- 0.01 to about unity corresponding to simple shot noise. Such experimental results are explained, stating that the reduction of cross correlation between drift and diffusion currents and autocorrelation of drift current component determining the level of noise occurs with decrease in SCR width bias-dependent. To explain the behavior of observed noise more properly, we propose, in addition to the mechanisms above, that the reduction in autocorrelation effect of each current component plays an important role to decrease the relevant noise to such extremely low levels. © 2008 IEEE.
Citation
5th International Conference on Electrical Engineering Electronics Computer Telecommunications and Information Technology Ecti Con 2008, 2, 809-812, 2008