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An extremely narrow UV pulse generation using a micro- and nano-ring system for pico-lithographic resolution
Author(s)
Chaiyasoonthorn, S.
Pornsuwancharoen, N.
Yupapin, P. P.
Date Issued
September 1, 2010
Type
Article
Abstract
We propose a new technique of an extremely narrow ultraviolet (UV) pulse width generation for pico-lithography technology using a nonlinear ring resonator system. A system consists of three micro- and a nano-optical ring resonators, which can be used to generate the 50 pm (10-12 m) optical spectral width at the ultraviolet wavelength. By using a soliton pulse with a pulse width of 50 ns, 1 W peak power, center wavelength at 1550 nm, after the soliton pulse is launched into a first ring device, the chaotic pulses are generated within the first ring. The chaotic filtering behaviors are performed by using the second and third ring devices, whereas the extremely short pulse, i.e. narrow spectral width, can be generated by using the extended nano-ring device. The broad spectrum of the harmonic waves is generated and filtered, especially the generation of third harmonic wave, which is known as the ultraviolet wavelength, is achieved, which is capable of forming pico-lithographic resolution. Results obtained have shown that the generation of the spectral width of 50 pm at a wavelength of 511.125 nm, with peak power at 35 mW is achieved. © 2009 Elsevier GmbH. All rights reserved.
Citation
Optik, 121(17), 1605-1609, 2010