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RF-sputtered V2O5 thin films on two different glass substrates

Author(s)
Khlayboonme, S. Tipawan
Thowladda, Warawoot
Date Issued
January 1, 2021
Type
Conference Paper
DOI
10.1016/j.matpr.2021.06.306
Abstract
Thin V2O5 films were deposited on two different commercial soda-lime glass substrates (A and B) by O2 reactive radio frequency magnetron sputtering using a vanadium target. The influences of the surface energy and roughness of the substrates on the structure and atomic bonding of the films were examined. The film on substrate A was polycrystalline, with eight crystal orientations, whereas the film on substrate B yielded an intense (001) diffraction peak of α-V2O5 and a weak (200) peak of β-V2O5, indicating preferred orientation along these planes. Structural analyses indicated that substrate B with lower surface energy and higher roughness enhanced the formation of a layered a-V2O5 structure.
Citation
Materials Today Proceedings, 49, 1263-1267, 2021
Subjects

3D surface topography...

Raman spectroscopy

Surface energy

Vanadium pentoxide

X-ray diffraction

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