Equipment modeling for plasma etch process using artificial neural network

Thammano, Arit

Equipment modeling for plasma etch process using artificial neural network

Author(s)

Thammano, Arit

Date Issued

December 1, 1998

Type

Article

Abstract

The artificial neural network, with the help from genetic algorithm, is introduced as an alternative simulation technique. This technique is easy and inexpensive yet very effective. The proposed technique enables process engineers to easily create the equipment modeling by themselves using the data collected in the past.

Citation

IEEE Asia Pacific Conference on Circuits and Systems Proceedings, 659-662, 1998