Surface morphology and wettability for thin films of beta-iron disilicide produced through direct-current sputtering utilizing a pair of facing targets

Charoenyuenyao, Peerasil; Promros, Nathaporn; Chaleawpong, Rawiwan; Yoshitake, Tsuyoshi

doi:10.1051/matecconf/201819201054

Surface morphology and wettability for thin films of beta-iron disilicide produced through direct-current sputtering utilizing a pair of facing targets

Author(s)

Charoenyuenyao, Peerasil

Promros, Nathaporn

Chaleawpong, Rawiwan

Yoshitake, Tsuyoshi

Date Issued

August 14, 2018

Type

Conference Paper

DOI

10.1051/matecconf/201819201054

Abstract

In the current work, beta-FeSi2 films were epitaxially produced onto Si(111) wafer substrates via usage of facing-targets direct-current sputtering (FTDCS). The temperature for substrate heating was maintained at 600 °C and the sputtering pressure was set at 1.33 × 10^-1 Pa. The surface morphology and contact angles of the beta-FeSi2 films were explored consistently in this research. Images of three-dimensional AFM and FESEM for the beta-FeSi2 film surface revealed a smooth surface with a root mean square roughness of 1.31 nm and a porous area. The average contact angle between the dropped water and beta-FeSi2 film surface was found to be 98.7°, establishing that the surface of the beta-FeSi2 films was hydrophobic. The acquired experimental results revealed the commencement of the hydrophobic surface feature of the beta-FeSi2 films produced via FTDCS approach.

Citation

Matec Web of Conferences, 192, 2018