Conformal photoresist coating for critical dimension improvement

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dc.contributor.authorLaddawan Supadee
dc.contributor.authorWisut Titiroongruang
dc.date.accessioned2025-07-21T05:51:07Z
dc.date.issued2010-01-01
dc.identifier.doi10.1109/inec.2010.5424787
dc.identifier.urihttps://dspace.kmitl.ac.th/handle/123456789/2411
dc.subjectPhotoresist
dc.subjectDeposition
dc.subjectGroove (engineering)
dc.subjectSpin Coating
dc.subjectConformal coating
dc.subjectCritical dimension
dc.subject.classificationAdvanced Materials and Semiconductor Technologies
dc.titleConformal photoresist coating for critical dimension improvement
dc.typeArticle

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