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Nitrogen Concentrations on Structural and Optical Properties of Aluminum Nitride Films Deposited by Reactive RF-Magnetron Sputtering
Nitrogen Concentrations on Structural and Optical Properties of Aluminum Nitride Films Deposited by Reactive RF-Magnetron Sputtering
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Date
2013-01-01
Authors
Amorn Thedsakhulwong
Kitsakorn Locharoenrat
Warawoot Thowladda
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Cavity magnetron
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https://dspace.kmitl.ac.th/handle/123456789/3846
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