Microstructure and Electrical Properties of Antimony Telluride Thin Films Deposited by RF Magnetron Sputtering on Flexible Substrate Using Different Sputtering Pressures

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dc.contributor.authorT. Khumtong
dc.contributor.authorP. Sukwisute
dc.contributor.authorA. Sakulkalavek
dc.contributor.authorR. Sakdanuphab
dc.date.accessioned2025-07-21T05:57:50Z
dc.date.issued2017-02-02
dc.identifier.doi10.1007/s11664-017-5303-5
dc.identifier.urihttps://dspace.kmitl.ac.th/handle/123456789/6274
dc.subject.classificationAdvanced Thermoelectric Materials and Devices
dc.titleMicrostructure and Electrical Properties of Antimony Telluride Thin Films Deposited by RF Magnetron Sputtering on Flexible Substrate Using Different Sputtering Pressures
dc.typeArticle

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