Anisotropic wet etching of a novel micro-texture structure for an Al/n-Si/Al metal-semiconductor-metal photodetector fabrication
| dc.contributor.author | Suttijalern, Kamonwan | |
| dc.contributor.author | Niemcharoen, Surasak | |
| dc.date.accessioned | 2026-08-06T10:33:16Z | |
| dc.date.available | 2026-08-06T10:33:16Z | |
| dc.date.issued | 2021-08-01 | |
| dc.description.abstract | Micro-electro-mechanical system fabrication involves molding on a single substrate. Chemical wet etching is common in these systems because it can provide a very high etch rate and selectivity. This optical device has been successfully completed fabrication by using the single-step lithography process. The surface was coated with PR and patterned using a single mask to create U-shaped structures by a wide electrode gap on a silicon substrate. Then it was etched using anisotropic wet etching process in potassium hydroxide, tetramethylammonium hydroxide (TMAH), silicic acid and dissolved silicon powder. The etchant created a 58% increase in the light sensitive area of the U-shaped trench in the structure higher compared to the planar structure. Random micro-pyramids, formed on the silicon surface in the U-shaped structure by the silicic acid-added TMAH solution, led to a ∼254 times higher ratio between photon generated current and dark current at reverse bias. This processing technique is a promising technology for improving performance for next-generation optical sensors or silicon photodetector. | |
| dc.identifier.citation | Journal of Micromechanics and Microengineering, 31(8), 2021 | |
| dc.identifier.doi | 10.1088/1361-6439/ac0e7e | |
| dc.identifier.issn | 09601317 | |
| dc.identifier.other | 2-s2.0-85111251974 | |
| dc.identifier.uri | https://dspace.kmitl.ac.th/handle/123456789/12205 | |
| dc.source | Journal of Micromechanics and Microengineering | |
| dc.subject | micro-texture | |
| dc.subject | optical absorption area | |
| dc.subject | silicon photodetector | |
| dc.subject | single-step lithography | |
| dc.subject | U-shaped structure | |
| dc.title | Anisotropic wet etching of a novel micro-texture structure for an Al/n-Si/Al metal-semiconductor-metal photodetector fabrication | |
| dc.type | Article |