Influence of Reactive Oxygen Gas on Sputtered-Vanadium Oxide Films under Post-Annealing in Vacuum

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dc.contributor.authorS.Tipawan Khlayboonme
dc.contributor.authorThowladda Warawoot
dc.date.accessioned2025-07-21T06:04:31Z
dc.date.issued2021-01-01
dc.identifier.doi10.4028/www.scientific.net/kem.872.27
dc.identifier.urihttps://dspace.kmitl.ac.th/handle/123456789/9979
dc.subjectVanadium Oxide
dc.subject.classificationTransition Metal Oxide Nanomaterials
dc.titleInfluence of Reactive Oxygen Gas on Sputtered-Vanadium Oxide Films under Post-Annealing in Vacuum
dc.typeArticle

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