Processing and Characterization of Amorphous Copper Oxide Thin Films Prepared by Reactive Magnetron Sputtering

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dc.contributor.authorThitinai Gaewdang
dc.contributor.authorNgamnit Wongcharoen
dc.date.accessioned2025-07-21T06:00:20Z
dc.date.issued2018-08-01
dc.identifier.doi10.4028/www.scientific.net/kem.775.238
dc.identifier.urihttps://dspace.kmitl.ac.th/handle/123456789/7674
dc.subjectVariable-range hopping
dc.subjectCopper oxide
dc.subjectAtmospheric temperature range
dc.subject.classificationCopper-based nanomaterials and applications
dc.titleProcessing and Characterization of Amorphous Copper Oxide Thin Films Prepared by Reactive Magnetron Sputtering
dc.typeArticle

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