Dry film holographic grating based on computer-generated mask lithography

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dc.contributor.authorChanikan Inneam
dc.contributor.authorS. Tipawan Khlayboonme
dc.contributor.authorMettaya Kitiwan
dc.contributor.authorWitoon Yindeesuk
dc.contributor.authorKeerayoot Srinuanjan
dc.date.accessioned2025-07-21T06:08:07Z
dc.date.issued2022-12-08
dc.identifier.doi10.1117/12.2658775
dc.identifier.urihttps://dspace.kmitl.ac.th/handle/123456789/11901
dc.subjectInterference lithography
dc.subject.classificationOptical Coatings and Gratings
dc.titleDry film holographic grating based on computer-generated mask lithography
dc.typeArticle

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