Intrinsic and extrinsic photoresponse of Mo/n-Si/Mo structures with wide electrode gap

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dc.contributor.authorK Kobayashi
dc.contributor.authorS Niemcharoen
dc.contributor.authorS Supadech
dc.contributor.authorY Yasumura
dc.contributor.authorK Sato
dc.date.accessioned2025-07-21T05:47:10Z
dc.date.issued2002-09-01
dc.identifier.doi10.1016/s0038-1101(02)00084-9
dc.identifier.urihttps://dspace.kmitl.ac.th/handle/123456789/238
dc.subjectBiasing
dc.subjectSIGNAL (programming language)
dc.subject.classificationSemiconductor materials and interfaces
dc.titleIntrinsic and extrinsic photoresponse of Mo/n-Si/Mo structures with wide electrode gap
dc.typeArticle

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