The Effects of O<sub>2</sub>:N<sub>2</sub> Gas Ratios on Structural, Optical, Electrical Properties of TiO<sub>x</sub>N<sub>y</sub> Thin Film Deposited by Reactive DC Magnetron Sputtering

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dc.contributor.authorTanakorn Khumtong
dc.contributor.authorRachsak Sakdanuphab
dc.date.accessioned2025-07-21T05:56:07Z
dc.date.issued2015-08-01
dc.identifier.doi10.4028/www.scientific.net/kem.659.540
dc.identifier.urihttps://dspace.kmitl.ac.th/handle/123456789/5299
dc.subject.classificationZnO doping and properties
dc.titleThe Effects of O<sub>2</sub>:N<sub>2</sub> Gas Ratios on Structural, Optical, Electrical Properties of TiO<sub>x</sub>N<sub>y</sub> Thin Film Deposited by Reactive DC Magnetron Sputtering
dc.typeArticle

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