Empirical modelling and optimization of pre-heat temperature and Ar flow rate using response surface methodology for stoichiometric Sb2Te3 thin films prepared by RF magnetron sputtering

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dc.contributor.authorTanakorn Khumtong
dc.contributor.authorAparporn Sakulkalavek
dc.contributor.authorRachsak Sakdanuphab
dc.date.accessioned2025-07-21T05:58:08Z
dc.date.issued2017-04-29
dc.identifier.doi10.1016/j.jallcom.2017.04.322
dc.identifier.urihttps://dspace.kmitl.ac.th/handle/123456789/6433
dc.subjectStoichiometry
dc.subjectCavity magnetron
dc.subject.classificationChalcogenide Semiconductor Thin Films
dc.titleEmpirical modelling and optimization of pre-heat temperature and Ar flow rate using response surface methodology for stoichiometric Sb2Te3 thin films prepared by RF magnetron sputtering
dc.typeArticle

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