Optical-beam profiling by field-controlled metal�semiconductor�metal structures

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dc.contributor.authorK. Kitagawa
dc.contributor.authorT. Aoki
dc.contributor.authorS. Khunkhao
dc.contributor.authorY. Wongprasert
dc.contributor.authorW. Titiroongruang
dc.contributor.authorK. Sato *
dc.date.accessioned2025-07-21T05:48:12Z
dc.date.issued2005-10-01
dc.identifier.doi10.1080/00207210500172164
dc.identifier.urihttps://dspace.kmitl.ac.th/handle/123456789/796
dc.subjectPhotocurrent
dc.subject.classificationAdvanced Materials Characterization Techniques
dc.titleOptical-beam profiling by field-controlled metal�semiconductor�metal structures
dc.typeArticle

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