Nanocrystalline Diamond Films Deposited by Two-Step Approach from CH<sub>4</sub>/H<sub>2</sub> Microwave Plasma: The Influence of Reactor Pressure

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dc.contributor.authorS.T. Khlayboonme
dc.contributor.authorW. Thowladda
dc.date.accessioned2025-07-21T05:53:59Z
dc.date.issued2013-07-01
dc.identifier.doi10.4028/www.scientific.net/amm.339.657
dc.identifier.urihttps://dspace.kmitl.ac.th/handle/123456789/4063
dc.subjectNanocrystalline material
dc.subject.classificationDiamond and Carbon-based Materials Research
dc.titleNanocrystalline Diamond Films Deposited by Two-Step Approach from CH<sub>4</sub>/H<sub>2</sub> Microwave Plasma: The Influence of Reactor Pressure
dc.typeArticle

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