Low resistance bisphenol-A based polybenzoxazine derived laser-induced graphene (LIG) and its microsupercapacitor application

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dc.contributor.authorPanuwat Luengrojanakul
dc.contributor.authorAnnop Klamchuen
dc.contributor.authorNarathon Khemasiri
dc.contributor.authorChuleekorn Chotsuwan
dc.contributor.authorKrittapas Charoensuk
dc.contributor.authorWinadda Wongwiriyapan
dc.contributor.authorSarawut Rimdusit
dc.date.accessioned2025-07-21T06:11:37Z
dc.date.issued2024-06-18
dc.identifier.doi10.1016/j.materresbull.2024.112948
dc.identifier.urihttps://dspace.kmitl.ac.th/handle/123456789/13703
dc.subject.classificationGraphene research and applications
dc.titleLow resistance bisphenol-A based polybenzoxazine derived laser-induced graphene (LIG) and its microsupercapacitor application
dc.typeArticle

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