Growth window and metal–insulator transition behavior of VO2 thin films deposited by pulsed laser deposition for thermal switch applications

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dc.contributor.authorSukittaya Jessadaluk
dc.contributor.authorSakon Rahong
dc.contributor.authorNavaphun Kayunkid
dc.contributor.authorNarathon Khemasiri
dc.contributor.authorAdirek Rangkasikorn
dc.contributor.authorAnnop Klamchuen
dc.contributor.authorJiti Nukeaw
dc.date.accessioned2026-05-08T19:26:28Z
dc.date.issued2026-2-25
dc.identifier.doi10.1016/j.ceramint.2026.02.364
dc.identifier.urihttps://dspace.kmitl.ac.th/handle/123456789/20599
dc.publisherCeramics International
dc.subjectTransition Metal Oxide Nanomaterials
dc.subjectChemical and Physical Properties of Materials
dc.subjectCopper-based nanomaterials and applications
dc.titleGrowth window and metal–insulator transition behavior of VO2 thin films deposited by pulsed laser deposition for thermal switch applications
dc.typeArticle

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