Effect of Annealing Temperatures on Morphological and Electrical Performances of Amorphous-Like Structured Tin Manganese Telluride Nanocomposite Films

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dc.contributor.authorJeeranun Rupsom
dc.contributor.authorVeeramol Vailikhit
dc.contributor.authorPichanan Teesetsopon
dc.contributor.authorAuttasit Tubtimtae
dc.date.accessioned2025-07-21T06:01:26Z
dc.date.issued2019-04-09
dc.identifier.doi10.1166/jnn.2019.16559
dc.identifier.urihttps://dspace.kmitl.ac.th/handle/123456789/8296
dc.subject.classificationChalcogenide Semiconductor Thin Films
dc.titleEffect of Annealing Temperatures on Morphological and Electrical Performances of Amorphous-Like Structured Tin Manganese Telluride Nanocomposite Films
dc.typeArticle

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