Measured and Extraction of Coupling Capacitive of Metal Interconnect Layers in VLSI

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dc.contributor.authorAnucha Ruangphanit
dc.contributor.authorItsariya Nissai
dc.contributor.authorRujipad Pedlub
dc.contributor.authorRangson Muanghlua
dc.date.accessioned2025-07-21T05:59:44Z
dc.date.issued2018-03-01
dc.identifier.doi10.1109/ieecon.2018.8712231
dc.identifier.urihttps://dspace.kmitl.ac.th/handle/123456789/7306
dc.subjectCapacitive coupling
dc.subject.classificationLow-power high-performance VLSI design
dc.titleMeasured and Extraction of Coupling Capacitive of Metal Interconnect Layers in VLSI
dc.typeArticle

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