Enhancing activated carbon supercapacitor electrodes using sputtered Cu-doped BiFeO3 thin films

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dc.contributor.authorNantawat Tanapongpisit
dc.contributor.authorSuchunya Wongprasod
dc.contributor.authorPeerawat Laohana
dc.contributor.authorSomchai Sonsupap
dc.contributor.authorJessada Khajonrit
dc.contributor.authorSupansa Musikajaroen
dc.contributor.authorUnchista Wongpratat
dc.contributor.authorBenjaporn Yotburut
dc.contributor.authorSanti Maensiri
dc.contributor.authorW. Meevasana
dc.contributor.authorWittawat Saenrang
dc.date.accessioned2026-05-08T19:14:54Z
dc.date.issued2024-11-13
dc.description.abstract, and over 90% retention after 1000 cycles, highlighting its durability. The uniform RF magnetron sputtering deposition is vital for mass production. Combined with impressive retention in asymmetric supercapacitors, this scalability suggests a promising pathway for large-scale manufacturing. Consequently, this work could pave the way for the large-scale production of supercapacitors.
dc.identifier.doi10.1038/s41598-024-79439-3
dc.identifier.urihttps://dspace.kmitl.ac.th/handle/123456789/14779
dc.publisherScientific Reports
dc.subjectSupercapacitor Materials and Fabrication
dc.subjectConducting polymers and applications
dc.subjectAdvanced Sensor and Energy Harvesting Materials
dc.titleEnhancing activated carbon supercapacitor electrodes using sputtered Cu-doped BiFeO3 thin films
dc.typeArticle

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