A new generation optical lithography using a third harmonic pulse generated by micro-ring resonators
| dc.contributor.author | Yupapin, P. P. | |
| dc.contributor.author | Chaiyasoonthorn, S. | |
| dc.contributor.author | Saneujit, O. | |
| dc.date.accessioned | 2026-08-06T10:00:01Z | |
| dc.date.available | 2026-08-06T10:00:01Z | |
| dc.date.issued | 2010-03-01 | |
| dc.description.abstract | We first propose a new system of a third harmonic generation by using a soliton pulse circulating in the integrated micro-ring devices. By using this system, the ultra-short pulse in the attosecond (as) and beyond can be easily generated. In principle, light pulse known as a soliton pulse is input into a design system. It consist the three-stage micro-ring resonators, where the ring radii are within the range between 5 and 35 μm. With the appropriate parameters such as ring radius, coupling ratio and nonlinear refractive index, the attosecond pulse is generated by filtering the chaotic signals within the micro-ring devices. One of the results obtained has shown that the generation of the ultra narrow pulse (spectral width) and sharp tip is achieved. The potential of using such a pulse for picometer (pm)-scale lithography is plausible. © 2008 Elsevier GmbH. All rights reserved. | |
| dc.identifier.citation | Optik, 121(6), 563-566, 2010 | |
| dc.identifier.doi | 10.1016/j.ijleo.2008.09.012 | |
| dc.identifier.issn | 00304026 | |
| dc.identifier.other | 2-s2.0-77649187608 | |
| dc.identifier.uri | https://dspace.kmitl.ac.th/handle/123456789/2983 | |
| dc.source | Optik | |
| dc.subject | High-resolution lithography | |
| dc.subject | New generation lithography | |
| dc.subject | Nonlinear micro-ring resonator | |
| dc.title | A new generation optical lithography using a third harmonic pulse generated by micro-ring resonators | |
| dc.type | Article |
