Electroreflectance study of antimony doped ZnO thin films grown by pulsed laser deposition

dc.contributor.authorSukittaya Jessadaluk
dc.contributor.authorNarathon Khemasiri
dc.contributor.authorPrapakorn Rattanawarinchai
dc.contributor.authorNavaphun Kayunkid
dc.contributor.authorSakon Rahong
dc.contributor.authorAdirek Rangkasikorn
dc.contributor.authorSupamas Wirunchit
dc.contributor.authorAnnop Klamchuen
dc.contributor.authorJiti Nukeaw
dc.date.accessioned2025-07-21T06:05:38Z
dc.date.issued2021-08-16
dc.identifier.doi10.1016/j.optmat.2021.111461
dc.identifier.urihttps://dspace.kmitl.ac.th/handle/123456789/10578
dc.subjectPulsed Laser Deposition
dc.subject.classificationZnO doping and properties
dc.titleElectroreflectance study of antimony doped ZnO thin films grown by pulsed laser deposition
dc.typeArticle

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