Electroreflectance study of antimony doped ZnO thin films grown by pulsed laser deposition

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dc.contributor.authorSukittaya Jessadaluk
dc.contributor.authorNarathon Khemasiri
dc.contributor.authorPrapakorn Rattanawarinchai
dc.contributor.authorNavaphun Kayunkid
dc.contributor.authorSakon Rahong
dc.contributor.authorAdirek Rangkasikorn
dc.contributor.authorSupamas Wirunchit
dc.contributor.authorAnnop Klamchuen
dc.contributor.authorJiti Nukeaw
dc.date.accessioned2026-05-08T19:19:17Z
dc.date.issued2021-8-16
dc.identifier.doi10.1016/j.optmat.2021.111461
dc.identifier.urihttps://dspace.kmitl.ac.th/handle/123456789/16938
dc.publisherOptical Materials
dc.subjectZnO doping and properties
dc.subjectGas Sensing Nanomaterials and Sensors
dc.subjectCopper-based nanomaterials and applications
dc.titleElectroreflectance study of antimony doped ZnO thin films grown by pulsed laser deposition
dc.typeArticle

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