Epitaxial growth of _-FeSi<sub>2</sub> thin films on Si(111) substrates by radio frequency magnetron sputtering and their application to near-infrared photodetection

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dc.contributor.authorNathaporn Promros
dc.contributor.authorRyuji Baba
dc.contributor.authorMotoki Takahara
dc.contributor.authorTarek M. Mostafa
dc.contributor.authorPhongsaphak Sittimart
dc.contributor.authorMahmoud Shaban
dc.contributor.authorTsuyoshi Yoshitake
dc.date.accessioned2025-07-21T05:56:57Z
dc.date.issued2016-05-24
dc.identifier.doi10.7567/jjap.55.06hc03
dc.identifier.urihttps://dspace.kmitl.ac.th/handle/123456789/5754
dc.subjectPhotocurrent
dc.subjectPhotodetection
dc.subjectPhotodiode
dc.subject.classificationSemiconductor materials and interfaces
dc.titleEpitaxial growth of _-FeSi<sub>2</sub> thin films on Si(111) substrates by radio frequency magnetron sputtering and their application to near-infrared photodetection
dc.typeArticle

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