Growth and characterization of Ni<inf>3</inf>FeN thin films by reactive gas timing RF magnetron sputtering

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dc.contributor.authorWicharn Techitdheera
dc.contributor.authorChewa Thassana
dc.contributor.authorWisanu Pecharapa
dc.contributor.authorJiti Nukaew
dc.date.accessioned2025-07-21T05:51:08Z
dc.date.issued2010-01-01
dc.identifier.doi10.1109/inec.2010.5424982
dc.identifier.urihttps://dspace.kmitl.ac.th/handle/123456789/2435
dc.subjectCavity magnetron
dc.subject.classificationMetal and Thin Film Mechanics
dc.titleGrowth and characterization of Ni<inf>3</inf>FeN thin films by reactive gas timing RF magnetron sputtering
dc.typeArticle

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