Photomodulated reflectance study on optical property of InN thin films grown by reactive gas-timing rf magnetron sputtering

dc.contributor.authorS. Porntheeraphat
dc.contributor.authorJ. Nukeaw
dc.date.accessioned2025-07-21T05:49:34Z
dc.date.issued2008-03-13
dc.identifier.doi10.1016/j.apsusc.2008.02.164
dc.identifier.urihttps://dspace.kmitl.ac.th/handle/123456789/1552
dc.subjectIndium nitride
dc.subjectAuger electron spectroscopy
dc.subjectCavity magnetron
dc.subject.classificationGaN-based semiconductor devices and materials
dc.titlePhotomodulated reflectance study on optical property of InN thin films grown by reactive gas-timing rf magnetron sputtering
dc.typeArticle

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