Nanocrystal-ZnO Thin Film Deposition by a Novel Reactive Gas-Timing RF Magnetron Sputtering Provided for UV Photodetectors

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dc.contributor.authorP. Panprom
dc.contributor.authorS. Porntheeraphat
dc.contributor.authorWin Bunjongpru
dc.contributor.authorT. Tiwawong
dc.contributor.authorW. Yamwong
dc.contributor.authorC. Hruanun
dc.contributor.authorAmporn Poyai
dc.contributor.authorJ. Nukeaw
dc.date.accessioned2025-07-21T05:51:09Z
dc.date.issued2010-01-01
dc.identifier.doi10.4028/www.scientific.net/amr.93-94.537
dc.identifier.urihttps://dspace.kmitl.ac.th/handle/123456789/2452
dc.subject.classificationZnO doping and properties
dc.titleNanocrystal-ZnO Thin Film Deposition by a Novel Reactive Gas-Timing RF Magnetron Sputtering Provided for UV Photodetectors
dc.typeArticle

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