Photoresist hardness study of high moment head magnetic recording fabrication

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dc.contributor.authorSanti Chatruprachewin
dc.contributor.authorLaddawan Supadee
dc.contributor.authorWisut Titiroongruang
dc.date.accessioned2025-07-21T05:52:05Z
dc.date.issued2011-05-01
dc.identifier.doi10.1109/ecticon.2011.5947763
dc.identifier.urihttps://dspace.kmitl.ac.th/handle/123456789/2986
dc.subjectPhotoresist
dc.subject.classificationAdhesion, Friction, and Surface Interactions
dc.titlePhotoresist hardness study of high moment head magnetic recording fabrication
dc.typeArticle

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