High Performance Metal Surface Coating Using Ta<sub>2</sub>O<sub>5 </sub>Thin Film Prepared by D.C. Magnetron Sputtering

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dc.contributor.authorNarathon Khemasiri
dc.contributor.authorChanunthorn Chananonnawathorn
dc.contributor.authorMati Horprathum
dc.contributor.authorPitak Eiamchai
dc.contributor.authorPongpan Chindaudom
dc.contributor.authorSiraphat Pratontep
dc.contributor.authorDarinee Phromyothin
dc.contributor.authorSupanit Porntheeraphat
dc.contributor.authorJiti Nukeaw
dc.date.accessioned2025-07-21T05:55:01Z
dc.date.issued2014-06-24
dc.identifier.doi10.4028/www.scientific.net/amr.979.240
dc.identifier.urihttps://dspace.kmitl.ac.th/handle/123456789/4653
dc.subject.classificationMetal and Thin Film Mechanics
dc.titleHigh Performance Metal Surface Coating Using Ta<sub>2</sub>O<sub>5 </sub>Thin Film Prepared by D.C. Magnetron Sputtering
dc.typeArticle

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