Effect of Annealing on Surface Morphology and Wettability of NC-FeSi<sub>2</sub> Films Produced via Facing-Target Direct-Current Sputtering

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dc.contributor.authorPeerasil Charoenyuenyao
dc.contributor.authorNathaporn Promros
dc.contributor.authorRawiwan Chaleawpong
dc.contributor.authorBunpot Saekow
dc.contributor.authorSupanit Porntheeraphat
dc.contributor.authorTsuyoshi Yoshitake
dc.date.accessioned2025-07-21T06:01:32Z
dc.date.issued2019-04-26
dc.identifier.doi10.1166/jnn.2019.17125
dc.identifier.urihttps://dspace.kmitl.ac.th/handle/123456789/8313
dc.subjectNanocrystalline material
dc.subject.classificationSemiconductor materials and interfaces
dc.titleEffect of Annealing on Surface Morphology and Wettability of NC-FeSi<sub>2</sub> Films Produced via Facing-Target Direct-Current Sputtering
dc.typeArticle

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