Improvement structure and electrical properties of ITO thin films by annealing treatment

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dc.contributor.authorI. Srithanachai
dc.contributor.authorN. Sangwaranatee
dc.date.accessioned2025-07-21T06:09:58Z
dc.date.issued2023-10-01
dc.identifier.doi10.1016/j.matpr.2023.10.133
dc.identifier.urihttps://dspace.kmitl.ac.th/handle/123456789/12860
dc.subject.classificationZnO doping and properties
dc.titleImprovement structure and electrical properties of ITO thin films by annealing treatment
dc.typeArticle

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