Persistent photocurrent characteristics of ZnO polycrystalline films prepared by RF magnetron sputtering

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dc.contributor.authorSuchada Worasawat
dc.contributor.authorKatsuyosi Tasaki
dc.contributor.authorYoichiro Neo
dc.contributor.authorWisanu Pecharapa
dc.contributor.authorYoshinori Hatanaka
dc.contributor.authorHidenori Mimura
dc.date.accessioned2025-07-21T06:01:22Z
dc.date.issued2019-03-06
dc.identifier.doi10.7567/1347-4065/ab0d0f
dc.identifier.urihttps://dspace.kmitl.ac.th/handle/123456789/8238
dc.subjectPhotoconductivity
dc.subjectPhotocurrent
dc.subject.classificationZnO doping and properties
dc.titlePersistent photocurrent characteristics of ZnO polycrystalline films prepared by RF magnetron sputtering
dc.typeArticle

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