Comparative Study of Non-Annealing and Annealing on Properties of ITO Deposited by RF Magnetron Sputtering

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dc.contributor.authorS. Tipawan Khlayboonme
dc.contributor.authorWarawoot Thowladda
dc.date.accessioned2025-07-21T05:56:06Z
dc.date.issued2015-08-01
dc.identifier.doi10.4028/www.scientific.net/kem.659.615
dc.identifier.urihttps://dspace.kmitl.ac.th/handle/123456789/5279
dc.subjectCavity magnetron
dc.subject.classificationZnO doping and properties
dc.titleComparative Study of Non-Annealing and Annealing on Properties of ITO Deposited by RF Magnetron Sputtering
dc.typeArticle

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