Physical feature exploration of nanocrystalline FeSi2 surface with argon plasma etching under varying power

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dc.contributor.authorNattakorn Borwornpornmetee
dc.contributor.authorPhongsaphak Sittimart
dc.contributor.authorRungrueang Phatthanakun
dc.contributor.authorHideki Nakajima
dc.contributor.authorBoonchoat Paosawatyanyong
dc.contributor.authorTsuyoshi Yoshitake
dc.contributor.authorNathaporn Promros
dc.date.accessioned2026-05-08T19:20:21Z
dc.date.issued2023-9-9
dc.identifier.doi10.1016/j.vacuum.2023.112588
dc.identifier.urihttps://dspace.kmitl.ac.th/handle/123456789/17498
dc.publisherVacuum
dc.subjectMetal and Thin Film Mechanics
dc.subjectSemiconductor materials and interfaces
dc.subjectSemiconductor materials and devices
dc.titlePhysical feature exploration of nanocrystalline FeSi2 surface with argon plasma etching under varying power
dc.typeArticle

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