Dry film holographic grating based on computer-generated mask lithography

Abstract

This paper presented an alternative technique for fabricating the dry film holographic grating based on a mask generated by computer simulation and experimental results. The mask was generated by a fringe pattern which is created by the mathematical model of two beams interference with various angles. Computer simulation of the fringe pattern was printed on film, i.e., the holographic grating mask. The mask was attached on dry film and then illuminated by UV light, where the lithography technique was applied. According to the lithography technique, the computer-generated holographic grating mask was transferred to dry film. After fabrication, fringe patterns obtained from the grating were observed. Then, the grating period was analyzed and confirmed by Scanning Electron Microscope (SEM). Experimental results show that the method could apply to fabricate the dry film holographic grating.