Omnidirectional anti-reflection properties of vertically align SiO2 nanorod films prepared by electron beam evaporation with glancing angle deposition

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dc.contributor.authorRattagan Prachachet
dc.contributor.authorP. Eiamchai
dc.contributor.authorS. Boonruang
dc.contributor.authorB. Samransuksamer
dc.contributor.authorM. Horprathum
dc.contributor.authorS. Limwichean
dc.contributor.authorC. Chananonnawathorn
dc.contributor.authorT. Lertvanithphol
dc.contributor.authorP. Muthitamongkol
dc.contributor.authorP. Buranasiri
dc.date.accessioned2025-07-21T05:59:45Z
dc.date.issued2018-03-05
dc.identifier.doi10.1117/12.2300959
dc.identifier.urihttps://dspace.kmitl.ac.th/handle/123456789/7322
dc.subjectNanorod
dc.subject.classificationOptical Coatings and Gratings
dc.titleOmnidirectional anti-reflection properties of vertically align SiO2 nanorod films prepared by electron beam evaporation with glancing angle deposition
dc.typeArticle

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